Intel switched on the world's first High-NA EUV machine; TSMC skipped the $400M tool. Being slow to the newest lithography once cost Intel a lost decade. Is TSMC repeating that mistake? Its confidence rests on Japan: Mitsui Chemicals' EUV pellicle and the HOYA/Shin-Etsu/AGC mask-blank near-monopoly (about 90% share).
Mitsui Chemicals was first in the world to mass-produce the EUV pellicle, a free-standing film tens of nanometers thick. From the ASML license to the carbon-nanotube pivot and a 2027 upgrade, here is why one invisible bottleneck sits with a single Japanese plant.
