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MoS2 Wafer-Scale Deposition: Japan's NIMS Breakthrough Paves Way for Sub-1nm Transistors

NIMS and University of Tokyo researchers have developed a revolutionary wafer-scale deposition technology for next-generation semiconductor material MoS2 (molybdenum disulfide). By discovering two key growth mechanisms—self-alignment and self-limiting—they achieved uniform, high-quality monolayer films across entire 2-inch wafers. This breakthrough opens the path to post-silicon semiconductors for sub-1nm node transistors.

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AI Data Center Transformation: Sharp's Sakai LCD Factory Reborn as KDDI and SoftBank's Cutting-Edge Hub

Sharp's iconic Sakai LCD factory, once the symbol of "LCD Sharp," is being transformed into one of Asia's largest AI data centers by KDDI and SoftBank. By repurposing the massive power and cooling infrastructure from the ¥430 billion facility, they brought a cutting-edge AI hub online in under a year, a powerful symbol of Japan's industrial transformation in the AI era.